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VERSION:2.0
PRODID:Dresden Technology Collections
BEGIN:VEVENT
UID:dca8dcb0-33a3-436d-8c76-0a663b8efe1e
DTSTART;TZID=Europe/Berlin:20260825T170000
DTEND;TZID=Europe/Berlin:20260825T190000
SEQUENCE:0
TRANSP:OPAQUE
LOCATION:Dresden Technology Collections (Junghansstraße 1–3 (Entrance on Schandauer Str.) 01277 Dresden)
SUMMARY:Lithography – Part 2: Technologies at the physical limit today, approaches for tomorrow
CLASS:PUBLIC
DESCRIPTION:Lithography is, and will remain, the key to the further development of microelectronics. This event offers an excellent opportunity to gain a better understanding of current technologies, learn about new approaches and exchange ideas with fellow professionals from the Silicon Saxony network. Whether you are already familiar with the semiconductor industry or are interested in the technological foundations of future innovations – this evening will provide valuable insights and stimulating discussions.193 nm lithography in device productionRolf Seltmann, former Lithography Fellow at Globalfoundries, provides insights into the technological challenges of 193 nm lithography.Atomic Pitch Splitting (APS™) – A new generation of semiconductor patterningJonas Sundqvist, CEO of AlixLabs, presents the innovative APS approach and demonstrates how the process can open up new possibilities for patterning future technology generations.An event organised by Silicon Saxony Alumni
DTSTAMP:20260819T101300Z
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